Myfab

Realize your nano vision
Johan Andersson

     Johan Andersson

 

Processing competence: Has worked with numerous silicon related projects, mostly MEMS applications including deep ASE plasma etching, surface profiling, bonding, contact lithography, oxidation/diffusion, LPCVD/PECVD deposition, metallization and wet chemistry etching (TMAH and KOH silicon etching), both for internal research groups as well as commercial companies.

Main tool responsibilities include DWL laser lithography, Centrotherm LPCVD furnaces and surface profiling.

 

Tel: +46 31 772 50 55

Mobile: +46 73 034 6292

List of tools where Johan Andersson is tool responsible

 NameTypeTool Id
DetailsMicroscope - Olympus MX40 - Silicon areaOptical Microscope102
DetailsEllipsometer - Sagax IsoscopeEllipsometer104
DetailsMicroscope - Olympus MX50 - III/V areaOptical Microscope106
DetailsSurface profiler - Tencor P15Surface profilometer108
DetailsSurface profiler - Wyko NT 1100 - OpticalSurface profilometer114
DetailsMicroscope - Olympus MX50 - Metrology areaOptical Microscope125
DetailsMicroscope stereo - Olympus SZH-11Optical Microscope126
DetailsWafer Inspection System - IR 127
DetailsStepper - ASML PAS 2500Stepper201
DetailsWet Bench - Solvent - Developer WorkWet bench208
DetailsSpinner - BLESpinncoater218
DetailsMask aligner - Suss MJB3 DUVMask aligner224
DetailsSurface profiler - Tencor AS500 #1Surface profilometer230
DetailsSurface profiler - Tencor AS500 #2Surface profilometer232
DetailsMicroscope stereo - Olympus SZX-9 - PL1Optical Microscope244
DetailsWet Bench - Hotplate & HMDS & OvenHot plate260
DetailsMicroscope - Olympus MX50 - Nano areaOptical Microscope266
DetailsDry etch ICP - STS - Deep Silicon etchICP etch307
DetailsSputter - FHRSputter400
DetailsQuartz tube cleaner 601
DetailsMicroscope - Olympus MX40 - III/V areaOptical Microscope630
DetailsMicroscope - Olympus MX41Optical Microscope635
DetailsMicroscope stereo - Olympus SZX-12Optical Microscope638
DetailsQuartz tube stocker 661
DetailsFurnace - Centrotherm #3.1 Al annealFurnace7051
DetailsFurnace - Centrotherm #3.2 Au annealFurnace7052
DetailsFurnace - Centrotherm #3.3 Hi temp annealFurnace7053
DetailsFurnace - Centrotherm #1.1 Oxidation (restricted)Furnace7071
DetailsFurnace - Centrotherm #1.2 Wet & dry oxidation (public)Furnace7072
DetailsFurnace - Centrotherm #1.3 Wet & dry oxidationFurnace7073
DetailsFurnace - Centrotherm #4.3 LPCVD - SiNFurnace7083
DetailsFurnace - Centrotherm #4-4 LP-PolysiliconFurnace7084
DetailsFurnace - Thermolyne - Open Tube/1600°CFurnace713
DetailsMicroscope stereo - Olympus SZX-9 - PL2Optical Microscope1010
DetailsMicroscope - Olympus BX52Optical Microscope1113
DetailsOven - Solid Dopant Storage 1114
DetailsSpinner - HeadwaySpinncoater1116
DetailsSpinner - Suss LabSpin6Spinncoater214
DetailsSurface Profiler - DektakSurface profilometer240
DetailsDry etch ICP - STSICP etch305
DetailsSpinner - Suss RCD8 209
DetailsMicroscope - Olympus MX50 - Nano area 243
DetailsLaser writer - Heidelberg Instruments DWL 2000 262